Two-photon lithography of nanorods in SU-8 photoresist

被引：252
|
作者：
Juodkazis, S
Mizeikis, V
Seet, KK
Miwa, M
Misawa, H [1 ]
机构：
[1] Hokkaido Univ, CREST, JST, Sapporo, Hokkaido 0010021, Japan
[2] Hokkaido Univ, Res Inst Elect Sci, Sapporo, Hokkaido 0010021, Japan
[3] Wakayama Univ, Fac Syst Engn, Dept Optomechatron, Wakayama 6408510, Japan
来源：
NANOTECHNOLOGY | 2005年 / 16卷 / 06期
关键词：
D O I：
10.1088/0957-4484/16/6/039
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Studies on two-photon lithography in negative SU-8 photoresist demonstrate the possibility of obtaining mechanically stable, stress-free, extended nanorods having lateral sizes of about 30 nm (corresponding to lambda/25 resolution). The high resolution achievable with the given combination of materials and fabrication techniques demonstrates its potential for the fabrication of large-scale nanostructures, such as photonic crystals with photonic stop gaps at visible wavelengths.
引用
收藏
页码：846 / 849
页数：4
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