Process optimization of optical lithography of SU-8 photoresist

被引：0

作者：

Zhang, Ye ^{[1
]}

Chen, Di ^{[1
]}

Zhang, Jinya ^{[1
]}

Zhu, Jun ^{[1
]}

Liu, Jingquan ^{[1
]}

机构：

[1] National Key Laboratory of Nano/Micro Fabrication Technology, Shanghai Jiaotong University, Shanghai 200030, China

来源：

Zhongguo Jixie Gongcheng/China Mechanical Engineering | 2005年 / 16卷 / SUPPL.期

关键词：

D O I：

暂无

中图分类号：

学科分类号：

摘要：

On the basis of UV-LIGA technique, we used SU-8 photoresist to fabricate high aspect ratio microstructures, the highest aspect ratio of which was 20. The influences of wavelength of exposing source and exposing dose on the resist microstructures was investigated. A non-line rule of microstructures' dimension change according to the exposing dose was found. The rule was explained from a number of reacting molecules and the space structure of polymer generated by the molecules. In light of the rule, a new method of eliminating the T-top of SU-8 microstructures was proposed.

引用

页码：437 / 440

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