Two-photon lithography of nanorods in SU-8 photoresist

被引：252

作者：

Juodkazis, S

Mizeikis, V

Seet, KK

Miwa, M

Misawa, H ^{[1
]}

机构：

[1] Hokkaido Univ, CREST, JST, Sapporo, Hokkaido 0010021, Japan

[2] Hokkaido Univ, Res Inst Elect Sci, Sapporo, Hokkaido 0010021, Japan

[3] Wakayama Univ, Fac Syst Engn, Dept Optomechatron, Wakayama 6408510, Japan

来源：

NANOTECHNOLOGY | 2005年 / 16卷 / 06期

关键词：

D O I：

10.1088/0957-4484/16/6/039

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Studies on two-photon lithography in negative SU-8 photoresist demonstrate the possibility of obtaining mechanically stable, stress-free, extended nanorods having lateral sizes of about 30 nm (corresponding to lambda/25 resolution). The high resolution achievable with the given combination of materials and fabrication techniques demonstrates its potential for the fabrication of large-scale nanostructures, such as photonic crystals with photonic stop gaps at visible wavelengths.

引用

页码：846 / 849

页数：4

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