IC makers maximize 300mm, 200mm wafer capacity

被引:0
|
作者
不详
机构
关键词
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:32 / 32
页数:1
相关论文
共 50 条
  • [31] Doubleside polishing -: a technology mandatory for 300mm wafer manufacturing
    Wenski, G
    Altmann, T
    Winkler, W
    Heier, G
    Hölker, G
    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2002, 5 (4-5) : 375 - 380
  • [32] Low-cost lithography for 300mm wafer packaging
    Hermanowski, J
    Cullmann, E
    MICROLITHOGRAPHY WORLD, 2004, 13 (02): : 4 - +
  • [33] In-flight performance of a 200mm x 200mm microchannel plate detector
    Green, James C.
    Nell, Nicholas J.
    Erickson, Nicholas
    Fleming, Brian T.
    France, Kevin C.
    Martin, Adrian
    Siegmund, Oswald H. W.
    Vallerga, John V.
    UV, X-RAY, AND GAMMA-RAY SPACE INSTRUMENTATION FOR ASTRONOMY XXI, 2019, 11118
  • [34] 300mm×300mm×12mm方形钢管直接成方工艺研究
    杜红青
    焊管, 2008, (01) : 53 - 56+99
  • [35] Taking IC manufacturing from 300mm pilot to production
    Tsai, NS
    SOLID STATE TECHNOLOGY, 2001, 44 (05) : 121 - +
  • [36] A simulation approach for dispatching techniques comparison in 200mm wafer foundry
    Chik, MA
    Ahmad, I
    Jamaluddin, MY
    2004 IEEE INTERNATIONAL CONFERENCE ON SEMICONDUCTOR ELECTRONICS, PROCEEDINGS, 2004, : 645 - 649
  • [37] 200mm recovery boost
    不详
    IEE REVIEW, 2003, 49 (05): : 15 - 15
  • [38] Coexistence of 200/300mm: A new way to do business
    Husain, A
    SOLID STATE TECHNOLOGY, 2004, 47 (06) : 124 - +
  • [39] Control wafer bow of InGaP on 200mm Si by strain engineering
    Wang, Bing
    Bao, Shuyu
    Made, Riko I.
    Lee, Kwang Hong
    Wang, Cong
    Lee, Kenneth Eng Kian
    Fitzgerald, Eugene A.
    Michel, Jurgen
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2017, 32 (12)
  • [40] Analysis of a 200/300mm vertical furnace with integrated metrology
    Claasen-Vujcic, T
    Hasper, A
    Abraham, M
    SOLID STATE TECHNOLOGY, 2001, 44 (04) : S6 - +