Schottky barrier inhomogeneities at the interface of few layer epitaxial graphene and silicon carbide

被引:77
|
作者
Shivaraman, Shriram [1 ]
Herman, Lihong H. [2 ]
Rana, Farhan [1 ]
Park, Jiwoong [3 ]
Spencer, Michael G. [1 ]
机构
[1] Cornell Univ, Sch Elect & Comp Engn, Ithaca, NY 14853 USA
[2] Cornell Univ, Sch Appl & Engn Phys, Ithaca, NY 14853 USA
[3] Cornell Univ, Dept Chem & Chem Biol, Ithaca, NY 14853 USA
基金
美国国家科学基金会;
关键词
METAL-SEMICONDUCTOR INTERFACES; ELECTRONIC-PROPERTIES; CONTACTS; DIODES; GRAPHITE;
D O I
10.1063/1.4711769
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this work, we study electron transport across the heterojunction interface of epitaxial few-layer graphene grown on silicon carbide and the underlying substrate. The observed Schottky barrier is characterized using current-voltage, capacitance-voltage and photocurrent spectroscopy techniques. It is found that the graphene/SiC heterojunction cannot be characterized by a single unique barrier height because of lateral barrier inhomogeneities. A Gaussian distribution of barrier heights with a mean barrier height phi(Bm) - 1.06 eV and standard deviation sigma - 137 +/- 11 meV explains the experimental data quite well. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4711769]
引用
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页数:4
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