Cyclopolymerization in the design of resist materials.

被引：0
|
作者：
Fréchet, JMJ [1 ]
Pasini, D [1 ]
Low, E [1 ]
Meagley, R [1 ]
Niu, J [1 ]
机构：
[1] Univ Calif Berkeley, Dept Chem, Berkeley, CA 94720 USA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1999年 / 217卷
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
090-PMSE
引用
收藏
页码：U417 / U417
页数：1
相关论文
共 50 条
  • [41] Recent advances in the design of resist materials for 157 nm lithography
    Houlihan, F
    Sakamuri, R
    Romano, A
    Rentkiewicz, D
    Dammel, RR
    Stepanenko, N
    Markert, M
    Vermeir, UMI
    Hohle, C
    Conley, W
    Miller, D
    Itani, T
    Shigematsu, M
    Kawaguchi, E
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2004, 17 (04) : 621 - 630
  • [42] The rational design of polymeric, EUV resist materials by QSPR modelling
    Jack, Kevin
    Liu, Heping
    Blakey, Idriss
    Hi, David
    Yueh, Wang
    Cao, Heidi
    Leeson, Michael
    Denbeaux, Greg
    Waterman, Justin
    Whittaker, Andrew
    ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXIV, 2007, 6519
  • [43] Design of High-sensitive Resist Materials Based on Polyacetals
    Maekawa, Hiroyuki
    Iwashige, Yutaro
    Yamamoto, Hiroki
    Okamoto, Kazumasa
    Kozawa, Takahiro
    Kudo, Hiroto
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2023, 36 (01) : 31 - 39
  • [44] The strength of materials.
    Voigt, W
    ZEITSCHRIFT DES VEREINES DEUTSCHER INGENIEURE, 1901, 45 : 1033 - 1035
  • [45] The testing of materials.
    不详
    NATURE, 1908, 77 : 404 - 404
  • [46] TOOL MATERIALS.
    Coleman, John R.
    Tooling and production, 1983, 49 (05): : 19 - 24
  • [47] INSTRUCTIONAL MATERIALS.
    Kastner, Margaret E.
    ACTA CRYSTALLOGRAPHICA A-FOUNDATION AND ADVANCES, 1996, 52 : C566 - C566
  • [48] Novel materials for 157nm bilayer resist design
    Dilocker, S
    Malik, S
    De, B
    ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XX, PTS 1 AND 2, 2003, 5039 : 627 - 632
  • [49] Resist Materials Design to Improve Resolution and Sensitivity in EUV Lithography
    Tsubaki, Hideaki
    Tsuchihashi, Tooru
    Tsuchimura, Tomotaka
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2009, 22 (01) : 77 - 84
  • [50] Structure of materials.
    Mrowka, B.
    NATURWISSENSCHAFTEN, 1935, 23 : 257 - 259
12345