Reducing the substrate losses of RF integrated inductors

被引：26
|
作者：
Mernyei, F [1 ]
Darrer, F
Pardoen, M
Sibrai, A
机构：
[1] Austria Mikro Syst Int AG, Budapest Design Off, H-1135 Budapest, Hungary
[2] Austria Mikro Syst Int AG, Dept Engn, Schloss Premstatten, A-8141 Unterpremstatten, Austria
来源：
IEEE MICROWAVE AND GUIDED WAVE LETTERS | 1998年 / 8卷 / 09期
关键词：
integrated inductor; on-chip spiral; quality factor; substrate loss;
D O I：
10.1109/75.720461
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
This letter introduces a new method for reducing the substrate-related losses of integrated spiral inductors for radio frequency (RF) applications. Measurement based equivalent circuit parameters are demonstrated. Using our method the quality factor increased from 5.3 to 6.0 at 3.5 GHz at an 1.8-nH inductor.
引用
收藏
页码：300 / 301
页数：2
相关论文
共 50 条
  • [11] Chapter 12 ferromagnetic RF integrated devices—RF integrated noise suppressor and integrated inductors
    K. H. Kim
    M. Yamaguchi
    The Physics of Metals and Metallography, 2006, 102 : S74 - S79
  • [12] Layout design of integrated RF spiral inductors
    Zohios, J
    Ismail, M
    IEEE CIRCUITS & DEVICES, 1998, 14 (02): : 9 - 12
  • [13] Design of RF integrated inductors by geometric scaling
    Badr, N
    Weber, RJ
    2002 45TH MIDWEST SYMPOSIUM ON CIRCUITS AND SYSTEMS, VOL III, CONFERENCE PROCEEDINGS, 2002, : 153 - 156
  • [14] Reducing Losses in foil wound air-cored inductors
    Stones, JC
    Williams, N
    Pollock, C
    SEVENTH INTERNATIONAL CONFERENCE ON POWER ELECTRONICS AND VARIABLE SPEED DRIVES, 1998, (456): : 399 - 404
  • [15] On the losses in substrate integrated waveguides
    Bozzi, Maurizio
    Pasian, Marco
    Perregrini, Luca
    Wu, Ke
    2007 EUROPEAN MICROWAVE CONFERENCE, VOLS 1-4, 2007, : 384 - +
  • [16] Modeling of metal and substrate losses in CMOS and BiCMOS inductors for RFICs
    Arcioni, P
    Castello, R
    Perregrini, L
    Sacchi, E
    Svelto, F
    MICROWAVE JOURNAL, 1999, 42 (08) : 62 - +
  • [17] Magnetic rf integrated thin-film inductors
    Yamaguchi, M
    Baba, M
    Suezawa, K
    Moizumi, T
    Arai, KI
    Shimada, Y
    Haga, A
    Tanabe, S
    Ito, K
    2000 IEEE MTT-S INTERNATIONAL MICROWAVE SYMPOSIUM DIGEST, VOLS 1-3, 2000, : 205 - 208
  • [18] NiCuZn ferrite thin films for RF integrated inductors
    Liu, F
    Ren, TL
    Yang, C
    Liu, LT
    Wang, AZ
    Yu, J
    MATERIALS LETTERS, 2006, 60 (11) : 1403 - 1406
  • [19] PARAMETRIC MACROMODELING OF INTEGRATED INDUCTORS FOR RF CIRCUIT DESIGN
    Passos, F.
    Ye, Y.
    Spina, D.
    Roca, E.
    Castro-Lopez, R.
    Dhaene, T.
    Fernandez, F. V.
    MICROWAVE AND OPTICAL TECHNOLOGY LETTERS, 2017, 59 (05) : 1207 - 1212
  • [20] A new geometrical optimization technique for rf integrated inductors
    Tan, HP
    Yeo, KS
    Ma, JG
    Do, MA
    MICROWAVE AND OPTICAL TECHNOLOGY LETTERS, 2000, 26 (01) : 39 - 41
12345