Analysis and measurement of the non-linear refractive index of SiOxNy using pedestal waveguides

被引：0
|
作者：
Sierra, Julian H. [1 ]
Carvalho, Daniel O. [2 ]
Samad, Ricardo E. [3 ]
Rangel, Ricardo C. [1 ,4 ]
Alayo, Marco, I [1 ]
机构：
[1] Univ Sao Paulo, Polytech Sch, Sao Paulo, Brazil
[2] Sao Paulo State Univ UNESP, Telecommun Dept, Sao Joao De Boa Vista, SP, Brazil
[3] IPEN CNEN SP, Ctr Lasers & Applicat, Sao Paulo, Brazil
[4] Sao Paulo State Technol Coll FATEC, Sao Paulo, Brazil
来源：
2019 34TH SYMPOSIUM ON MICROELECTRONICS TECHNOLOGY AND DEVICES (SBMICRO 2019) | 2019年
基金：
巴西圣保罗研究基金会;
关键词：
optical devices; non-linear photonics; silicon oxynitride; self-phase modulation; non-linear refractive index; integrated photonics; microelectronics;
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
In this work, the non-linear refractive index (n(2)) of silicon oxynitride (SiOxNy) is determined, obtaining a value for this material of n(2) = 2.11x10(-19) m(2)/W. The results demonstrate that this material has interesting properties for the development of non-linear optical devices. The paper presents in detail the waveguide fabrication process using the pedestal technique, which allows using different materials since it does not require etching to define the sidewalls of the waveguides. We show the results of the measurement of the n(2) employing the non-linear optical phenomena of Self-Phase Modulation (SPM).
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页数：5
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