Deep Level Transient Spectroscopy study of dislocations in SiGe/Si heterostructures

被引:0
|
作者
Lu, Jinggang [1 ]
Park, Yongkook [1 ]
Rozgonyi, George A. [1 ]
机构
[1] N Carolina State Unive, Dept Mat Sci & Engn, Box 7907, Raleigh, NC 27695 USA
关键词
D O I
暂无
中图分类号
TH [机械、仪表工业];
学科分类号
0802 ;
摘要
Examination of dislocations in the as-grown and annealed SiGe/Si heterostructures by DLTS indicates the three strong DLTS bands from 70 to 270K in the as-grown sample are likely related to intrinsic point defects or dislocation trails. It was found that a small amount of Fe at dislocations dramatically increases their electrical activity, and the trap concentration due to Fe-decorated dislocations can well exceed the total Fe impurities presented along dislocations. Through examining the competitive trapping of Fe at boron and dislocations, it is suggested that Fe trapping only happens at disordered sites along dislocations, such as kinks.
引用
收藏
页码:251 / +
页数:2
相关论文
共 50 条
  • [41] Photoreflectance spectroscopy for study of Si/SiGe/Si heterostructure
    Liu, ZH
    Chen, CC
    Lin, HW
    Xiong, XY
    Dou, WZ
    Pei-Hsin, T
    JOURNAL OF RARE EARTHS, 2004, 22 : 17 - 20
  • [42] Generation of misfit dislocations and stacking faults in supercritical thickness strained-Si/SiGe heterostructures
    Kimura, Y
    Sugii, N
    Kimura, S
    Inui, K
    Hirasawa, W
    APPLIED PHYSICS LETTERS, 2006, 88 (03) : 1 - 3
  • [43] DEEP-LEVEL TRANSIENT SPECTROSCOPY STUDY OF BONDED WAFERS
    USAMI, A
    KANEKO, K
    ITO, A
    WADA, T
    ISHIGAMI, S
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1994, 9 (07) : 1366 - 1369
  • [44] Cathodoluminescence and EBIC study on misfit dislocations in SiGe/Si heterostructure
    Sekiguchi, T
    Sumino, K
    Radzimski, ZJ
    Rozgonyi, GA
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1996, 42 (1-3): : 141 - 145
  • [45] Cathodoluminescence and EBIC study on misfit dislocations in SiGe/Si heterostructure
    Sekiguchi, T.
    Sumino, K.
    Radzimski, Z.J.
    Rozgonyi, G.A.
    Materials science & engineering. B, Solid-state materials for advanced technology, 1996, B42 (1-3): : 141 - 145
  • [46] In situ studies of the interaction of dislocations with point defects during annealing of ion implanted Si/SiGe/Si (001) heterostructures
    Stach, EA
    Hull, R
    Bean, JC
    Jones, KS
    Nejim, A
    MICROSCOPY AND MICROANALYSIS, 1998, 4 (03) : 294 - 307
  • [47] Roughness analysis of Si/SiGe heterostructures
    Feenstra, R.M.
    Lutz, M.A.
    Stern, Frank
    Ismail, K.
    Mooney, P.M.
    LeGoues, F.K.
    Stanis, C.
    Chu, J.O.
    Meyerson, B.S.
    Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 1995, 13 (04): : 1608 - 1612
  • [48] Spin splitting in SiGe/Si heterostructures
    Nestoklon, M. O.
    Golub, L. E.
    Ivchenko, E. L.
    PHYSICS OF SEMICONDUCTORS, PTS A AND B, 2007, 893 : 387 - +
  • [49] IR absorption in SiGe/Si heterostructures
    Avrutin, VS
    Vyatkin, AF
    Izyumskaya, NF
    Pustovit, AN
    Kalinushkin, VP
    Stavrovsky, DB
    Uvarov, OV
    Yuryev, VA
    IZVESTIYA AKADEMII NAUK SERIYA FIZICHESKAYA, 2001, 65 (02): : 201 - 202
  • [50] ROUGHNESS ANALYSIS OF SI/SIGE HETEROSTRUCTURES
    FEENSTRA, RM
    LUTZ, MA
    STERN, F
    ISMAIL, K
    MOONEY, PM
    LEGOUES, FK
    STANIS, C
    CHU, JO
    MEYERSON, BS
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1995, 13 (04): : 1608 - 1612