Nanocluster epitaxy by annealing: Ag on H-terminated Si(111) surfaces

被引:0
|
作者
Li, BQ [1 ]
Shi, YF [1 ]
Bording, J [1 ]
Zuo, JM [1 ]
机构
[1] Univ Illinois, Dept Mat Sci & Engn, Urbana, IL 61801 USA
来源
MORPHOLOGICAL AND COMPOSITIONAL EVOLUTION OF THIN FILMS | 2003年 / 749卷
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中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We report an experimental investigation on the morphology and orientation of Ag nanoclusters by RT deposition and subsequent annealing. We show that epitaxial Ag clusters of 2 similar to 6 nm in diameter can be synthesized in this way. The RT self-assembled Ag clusters grow as mostly single-crystal crystallites with Ag(l I I)//Si(I 11), but the in-plane orientation has a dispersion of similar to 9degrees centering at Si[I 10] direction. Upon annealing, the Ag clusters drastically rotated to the epitaxial configuration with the in-plane orientation aligned to the Ag[l 10]//Si[1 10] direction. The rotation and epitaxy of the Ag nanoclusters are explained based on a coincident site lattice model and interface energy minimization.
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页码:41 / 46
页数:6
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