A self-consistent global model of solenoidal-type inductively coupled plasma discharges including the effects of radio-frequency bias power
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作者:
Kwon, D. C.
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Natl Fus Res Inst, Convergence Plasma Res Ctr, Taejon 305333, South KoreaNatl Fus Res Inst, Convergence Plasma Res Ctr, Taejon 305333, South Korea
Kwon, D. C.
[1
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Chang, W. S.
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Natl Fus Res Inst, Convergence Plasma Res Ctr, Taejon 305333, South KoreaNatl Fus Res Inst, Convergence Plasma Res Ctr, Taejon 305333, South Korea
Chang, W. S.
[1
]
Park, M.
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Korea Adv Inst Sci & Technol, Dept Phys, Taejon 305701, South KoreaNatl Fus Res Inst, Convergence Plasma Res Ctr, Taejon 305333, South Korea
Park, M.
[2
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You, D. H.
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Kyoungwon Tech Inc, Songnam 462806, South KoreaNatl Fus Res Inst, Convergence Plasma Res Ctr, Taejon 305333, South Korea
You, D. H.
[3
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Song, M. Y.
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Natl Fus Res Inst, Convergence Plasma Res Ctr, Taejon 305333, South KoreaNatl Fus Res Inst, Convergence Plasma Res Ctr, Taejon 305333, South Korea
Song, M. Y.
[1
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You, S. J.
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Korea Res Inst Stand & Sci, Ctr Vacuum Technol, Taejon 305340, South KoreaNatl Fus Res Inst, Convergence Plasma Res Ctr, Taejon 305333, South Korea
You, S. J.
[4
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Im, Y. H.
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Chonbuk Natl Univ, Div Chem Engn, Jeonju 561756, South KoreaNatl Fus Res Inst, Convergence Plasma Res Ctr, Taejon 305333, South Korea
Im, Y. H.
[5
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Yoon, J. -S.
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Natl Fus Res Inst, Convergence Plasma Res Ctr, Taejon 305333, South KoreaNatl Fus Res Inst, Convergence Plasma Res Ctr, Taejon 305333, South Korea
Yoon, J. -S.
[1
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机构:
[1] Natl Fus Res Inst, Convergence Plasma Res Ctr, Taejon 305333, South Korea
[2] Korea Adv Inst Sci & Technol, Dept Phys, Taejon 305701, South Korea
[3] Kyoungwon Tech Inc, Songnam 462806, South Korea
[4] Korea Res Inst Stand & Sci, Ctr Vacuum Technol, Taejon 305340, South Korea
[5] Chonbuk Natl Univ, Div Chem Engn, Jeonju 561756, South Korea
We developed a self-consistent global simulator of solenoidal-type inductively coupled plasma discharges and observed the effect of the radio-frequency (rf) bias power on the plasma density and the electron temperature. We numerically solved a set of spatially averaged fluid equations for charged particles, neutrals, and radicals. Absorbed power by electrons is determined by using an analytic electron heating model including the anomalous skin effect. To analyze the effects of rf bias power on the plasma properties, our model also combines the electron heating and global transport modules with an rf sheath module in a self-consistent manner. The simulation results are compared with numerical results by using the commercial software package CFD-ACE+ (ESI group) and experimental measurements by using a wave cutoff probe and a single Langmuir probe. (C) 2011 American Institute of Physics. [doi:10.1063/1.3572264]
机构:
Dalian Univ Technol, Sch Phys, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R China
Dalian Polytech Univ, Sch Informat Sci & Engn, Dalian 116034, Peoples R ChinaDalian Univ Technol, Sch Phys, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R China
Zhao, Lu-Lu
Liu, Yue
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Dalian Univ Technol, Sch Phys, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R ChinaDalian Univ Technol, Sch Phys, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R China
Liu, Yue
Samir, Tagra
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Dalian Univ Technol, Sch Phys, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R ChinaDalian Univ Technol, Sch Phys, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R China
机构:
Dalian Univ Technol, Sch Phys, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R ChinaDalian Univ Technol, Sch Phys, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R China
Xue, Chan
Gao, Fei
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Dalian Univ Technol, Sch Phys, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R ChinaDalian Univ Technol, Sch Phys, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R China
Gao, Fei
Liu, Yong-Xin
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机构:
Dalian Univ Technol, Sch Phys, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R ChinaDalian Univ Technol, Sch Phys, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R China
Liu, Yong-Xin
Liu, Jia
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机构:
Shanghai Inst Space Prop, Shanghai 201112, Peoples R ChinaDalian Univ Technol, Sch Phys, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R China
Liu, Jia
Wang, You-Nian
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Dalian Univ Technol, Sch Phys, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R ChinaDalian Univ Technol, Sch Phys, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R China
机构:
Key Laboratory of Materials Modification by Laser,Ion,and Electron Beams(Ministry of Education),School of Physics,Dalian University of TechnologyKey Laboratory of Materials Modification by Laser,Ion,and Electron Beams(Ministry of Education),School of Physics,Dalian University of Technology
刘永新
刘佳
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Shanghai Institute of Space PropulsionKey Laboratory of Materials Modification by Laser,Ion,and Electron Beams(Ministry of Education),School of Physics,Dalian University of Technology
刘佳
王友年
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Key Laboratory of Materials Modification by Laser,Ion,and Electron Beams(Ministry of Education),School of Physics,Dalian University of TechnologyKey Laboratory of Materials Modification by Laser,Ion,and Electron Beams(Ministry of Education),School of Physics,Dalian University of Technology