Formation of Si Nanocrystallites in Al-Added Amorphous Si Films by Electron Beam Irradiation (vol 49, 035001, 2010)

被引：0
|
作者：
Shim, Jae-Hyun [1 ]
Cho, Nam-Hee [1 ]
Kim, Jin-Gyu [2 ]
Kim, Youn-Joong [2 ]
机构：
[1] Inha Univ, Div Mat Sci & Engn, Inchon 402751, South Korea
[2] Korea Basic Sci Inst, Electron Microscopy Team, Taejon 3053333, South Korea
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS | 2010年 / 49卷 / 05期
关键词：
D O I：
10.1143/JJAP.49.059201
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页数：1
相关论文
共 50 条
  • [41] Heat treatment temperature effects on the formation of Mg2Si films deposited by electron beam evaporation
    Qingquan Xiao
    Di Fang
    Xiaojun Liu
    Yangfang Liao
    Kejie Zhao
    Quan Xie
    Journal of Materials Science: Materials in Electronics, 2017, 28 : 702 - 706
  • [42] Heat treatment temperature effects on the formation of Mg2Si films deposited by electron beam evaporation
    Xiao, Qingquan
    Fang, Di
    Liu, Xiaojun
    Liao, Yangfang
    Zhao, Kejie
    Xie, Quan
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2017, 28 (01) : 702 - 706
  • [43] Selective amorphization and novel coaxial structure formation of a single crystal Si nanowire induced by focused electron beam irradiation
    Li, Feng
    Su, Jiang-Bin
    Li, Lun-Xiong
    Gongneng Cailiao/Journal of Functional Materials, 2014, 45 (03): : 03079 - 03082
  • [44] Model for electron-beam-induced crystallization of amorphous Me-Si-C (Me = Nb or Zr) thin films
    Tengstrand, Olof
    Nedfors, Nils
    Andersson, Matilda
    Lu, Jun
    Jansson, Ulf
    Flink, Axel
    Eklund, Per
    Hultman, Lars
    JOURNAL OF MATERIALS RESEARCH, 2014, 29 (23) : 2854 - 2862
  • [45] METALORGANIC MOLECULAR-BEAM EPITAXY OF GAMMA-AL2O3 INSULATOR FILMS ON SI WITH LASER IRRADIATION
    SAWADA, K
    ISHIDA, M
    NAKAMURA, T
    SUZAKI, T
    JOURNAL OF CRYSTAL GROWTH, 1989, 95 (1-4) : 494 - 499
  • [46] Charging Effects in Al-SiO2-p-Si Structures After Low-Energy Electron Beam Irradiation
    P. S. Vergeles
    Yu. O. Kulanchikov
    E. B. Yakimov
    Journal of Electronic Materials, 2020, 49 : 5178 - 5183
  • [47] Formation of Ultra Fine Grained Microstructure in Aluminum Bronzes of the Cu-Al, Cu-Al-Si, and Cu-Al-Si-Mn Systems After Electron Beam Additive Manufacturing
    Filippov, A. V.
    Shamarin, N. N.
    Semenchuk, N. V.
    Filippova, E. O.
    RUSSIAN PHYSICS JOURNAL, 2024, 67 (09) : 1364 - 1372
  • [48] Charging Effects in Al-SiO2-p-Si Structures After Low-Energy Electron Beam Irradiation
    Vergeles, P. S.
    Kulanchikov, Yu O.
    Yakimov, E. B.
    JOURNAL OF ELECTRONIC MATERIALS, 2020, 49 (09) : 5178 - 5183
  • [49] LIGHT ION-BEAM IRRADIATION DAMAGES IN THE AMORPHOUS FILMS OF SI3N4-SIC SYSTEM PREPARED BY PLASMA CVD
    KAMATA, K
    YATSUI, K
    KANNO, M
    AIZAWA, N
    MORIYAMA, M
    YOGYO-KYOKAI-SHI, 1987, 95 (06): : 616 - 622
  • [50] Beam-induced crystallization of amorphous Me–Si–C (Me = Nb or Zr) thin films during transmission electron microscopy
    Olof Tengstrand
    Nils Nedfors
    Matilda Andersson
    Jun Lu
    Ulf Jansson
    Axel Flink
    Per Eklund
    Lars Hultman
    MRS Communications, 2013, 3 : 151 - 155
12345