Formation of Si Nanocrystallites in Al-Added Amorphous Si Films by Electron Beam Irradiation (vol 49, 035001, 2010)

被引：0
|
作者：
Shim, Jae-Hyun [1 ]
Cho, Nam-Hee [1 ]
Kim, Jin-Gyu [2 ]
Kim, Youn-Joong [2 ]
机构：
[1] Inha Univ, Div Mat Sci & Engn, Inchon 402751, South Korea
[2] Korea Basic Sci Inst, Electron Microscopy Team, Taejon 3053333, South Korea
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS | 2010年 / 49卷 / 05期
关键词：
D O I：
10.1143/JJAP.49.059201
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页数：1
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