Effective coating of titania nanoparticles with alumina via atomic layer deposition

被引:25
|
作者
Azizpour, H. [1 ]
Talebi, M. [2 ]
Tichelaar, F. D. [3 ]
Sotudeh-Gharebagh, R. [1 ]
Guo, J. [4 ]
van Ommen, J. R. [2 ]
Mostoufi, N. [1 ]
机构
[1] Univ Tehran, Coll Engn, Sch Chem Engn, Multiphase Syst Res Lab, POB 11155-4563, Tehran, Iran
[2] Delft Univ Technol, Fac Sci Appl, Maasweg 9, NL-2629 HZ Delft, Netherlands
[3] Delft Univ Technol, Natl Ctr HREM, Kavli Inst Nanosci, Lorentzweg 1, NL-2628 CJ Delft, Netherlands
[4] Sichuan Univ, Coll Chem Engn, Multiphase Mass Transfer & React Engn Lab, Chengdu 610065, Sichuan, Peoples R China
关键词
Atomic layer deposition; Growth per cycle; Oxidizer; Photocatalytic activity; Coating of titania; FLUIDIZED-BED REACTOR; GAS-PHASE DEPOSITION; ATMOSPHERIC-PRESSURE; SURFACE-CHEMISTRY; ROOM-TEMPERATURE; PARTICLES; AL2O3; GROWTH; FILMS; OXIDE;
D O I
10.1016/j.apsusc.2017.07.168
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Alumina films were deposited on titania nanoparticles via atomic layer deposition (ALD) in a fluidized bed reactor at 180 degrees C and 1 bar. Online mass spectrometry was used for real time monitoring of effluent gases from the reactor during each reaction cycle in order to determine the optimal dosing time of precursors. Different oxygen sources w ere used to see which oxygen source, in combination with trimethyl aluminium (TMA), provides the highest alumina growth per cycle (GPC). Experiments were carried out in 4, 7 and 10 cycles using the optimal dosing time of precursors. Several characterization methods, such as high resolution transmission electron microscopy (HRTEM), Brunauer-Emmett-Teller (BET), energy dispersive X-ray spectroscopy (EDX), Fourier transform infrared (FTIR), X-ray diffraction (XRD) and instrumental neutron activation analysis (INAA), were conducted on the products. Formation of the alumina film was confirmed by EDX mapping and EDX line profiling, FTIR and TEM. When using either water or deuterium oxide as the oxygen source, the thickness of the alumina film was greater than that of ozone. The average GPC measured by TEM for the ALD of TM A with water, deuterium oxide and ozone was about 0.16 nm, 0.15 nm and 0.11 nm, respectively. The average GPC calculated using the mass fraction of aluminum from INAA was close to those measured from TEM images. Excess amounts of pre-cursors lead to a higher average growth of alumina film per cycle due to insufficient purging time. XRD analysis demonstrated that amorphous alumina was coated on titania nanoparticles. This amorphous layer was easily distinguished from the crystalline core in the TEM images. Decrease in the photocatalytic activity of titania nanoparticles after alumina coating was confirmed by measuring degradation of Rhodamine B by ultraviolet irradiation. (C) 2017 Elsevier B.V. All rights reserved.
引用
收藏
页码:480 / 496
页数:17
相关论文
共 50 条
  • [41] Mechanisms of alumina growth via atomic layer deposition on nickel oxide and metallic nickel surfaces
    Ospina-Acevedo, Francisco Alejandro
    Beltran, Saul Perez
    Balbuena, Perla B.
    PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 2019, 21 (44) : 24543 - 24553
  • [42] Alumina nanocoating assisted dispersion stability of permanent violet pigments via atomic layer deposition
    Xiang, Junren
    Zhang, Jing
    Li, Jiawei
    Shao, Huachen
    Wang, Licheng
    Liu, Xiao
    Shan, Bin
    Chen, Rong
    MATERIALS CHEMISTRY AND PHYSICS, 2022, 282
  • [43] Micron and nanoparticle coating using atomic layer deposition
    Weimer, Alan W.
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2006, 231
  • [44] Ti coating of nanocrystalline diamond by atomic layer deposition
    Zang, JB
    Lu, J
    Wang, YH
    Qi, XH
    Yuan, YG
    ADVANCES IN GRINDING AND ABRASIVE TECHNOLOGY XIII, 2006, 304-305 : 48 - 51
  • [45] Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
    Paul, Pallabi
    Pfeiffer, Kristin
    Szeghalmi, Adriana
    COATINGS, 2020, 10 (01)
  • [46] Vibration atomic layer deposition for conformal nanoparticle coating
    Park, Suk Won
    Kim, Jun Woo
    Choi, Hyung Jong
    Shim, Joon Hyung
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2014, 32 (01):
  • [47] Atomic Layer Deposition excellence in Thin film Coating
    Pimenoff, Joe
    VAKUUM IN FORSCHUNG UND PRAXIS, 2012, 24 (06) : 10 - 13
  • [48] Atomic layer deposition for the conformal coating of nanoporous materials
    Elam, Jeffrey W.
    Xiong, Guang
    Han, Catherine Y.
    Wang, H. Hau
    Birrell, James P.
    Welp, Ulrich
    Hryn, John N.
    Pellin, Michael J.
    Baumann, Theodore F.
    Poco, John F.
    Satcher, Joe H., Jr.
    JOURNAL OF NANOMATERIALS, 2006, 2006
  • [49] Tungsten atomic layer deposition on cobalt nanoparticles
    Wilson, C. A.
    Goldstein, D. N.
    McCormick, J. A.
    Weimer, A. W.
    George, S. M.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2008, 26 (03): : 430 - 437
  • [50] Fabrication of anodic and atomic layer deposition-alumina coated titanium implants for effective osteointegration applications
    Erturk, Pinar Alpaslan
    Altuntas, Sevde
    Irmak, Gulseren
    Buyukserin, Fatih
    JOURNAL OF BIOMEDICAL MATERIALS RESEARCH PART A, 2025, 113 (01)