Vibration atomic layer deposition for conformal nanoparticle coating

被引:11
|
作者
Park, Suk Won [1 ]
Kim, Jun Woo [1 ]
Choi, Hyung Jong [1 ]
Shim, Joon Hyung [1 ]
机构
[1] Korea Univ, Sch Mech Engn, Seoul 136701, South Korea
来源
基金
新加坡国家研究基金会;
关键词
THIN-FILM GROWTH; FLUIDIZED-BED; PARTICLES; REACTOR; FORCES;
D O I
10.1116/1.4845735
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
A vibration atomic layer deposition reactor was developed for fabricating a conformal thin-film coating on nanosize particles. In this study, atomic layer deposition of 10-15-nm-thick Al2O3 films was conducted on a high-surface-area acetylene black powder with particle diameters of 200-250 nm. Intense vibration during the deposition resulted in the effective separation of particles, overcoming the interparticle agglomeration force and enabling effective diffusion of the precursor into the powder chunk; this phenomenon led to the formation of a conformal film coating on the nanopowder particles. It was also confirmed that the atomic layer deposition Al2O3 films initially grew on the high-surface-area acetylene black powder particles as discrete islands, presumably because chemisorption of the precursor and water occurred only on a few sites on the high-surface-area acetylene black powder surface. Relatively sluggish growth of the films during the initial atomic layer deposition cycles was identified from composition analysis. (C) 2014 American Vacuum Society.
引用
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页数:5
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