Crystalline silicon films by chemical vapor deposition on glass for thin film solar cells

被引:0
|
作者
Bergmann, RB [1 ]
Brendel, R [1 ]
Wolf, M [1 ]
Lolgen, P [1 ]
Werner, JH [1 ]
Krinke, J [1 ]
Strunk, HP [1 ]
机构
[1] MAX PLANCK INST FESTKORPERFORSCH,D-70569 STUTTGART,GERMANY
关键词
D O I
10.1109/PVSC.1996.564021
中图分类号
V [航空、航天];
学科分类号
08 ; 0825 ;
摘要
引用
收藏
页码:365 / 370
页数:6
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