Lineselective CO2-lasers with variable line-spacing and variable reflectivity silicon gratings

被引：0

作者：

Schulz, R ^{[1
]}

Collischon, M ^{[1
]}

Brand, H ^{[1
]}

Schmidt, LP ^{[1
]}

机构：

[1] Univ Erlangen Nurnberg, Lehrstuhl Hochfrequenztech, D-91058 Erlangen, Germany

来源：

XV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers Pt 1 and 2 | 2005年 / 5777卷

关键词：

CO2-laser; lineselective; grating; Littrow; unstable resonator; silicon; anisotropic etching;

D O I：

10.1117/12.611037

中图分类号：

O69 [应用化学];

学科分类号：

081704 ;

摘要：

A lineselective CO2-laser with an unstable resonator is presented. The CO2-laser is realised with an rf-excited slab geometry to get a compact design with high output power. As lineselective element a grating in Littrow mount is used. The gratings are manufactured by anisotropic etching of silicon. The grating has a variable duty cycle to obtain a variable reflectivity. Furthermore, gratings are presented that have focusing properties by a variation of the grating periodicity.

引用

页码：742 / 745

页数：4

共 37 条

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