A microfabricated inductively coupled plasma excitation source

被引：1

作者：

Wang Yong-Qing ^{[1
,3
]}

Pu Yong-Ni ^{[1
]}

Sun Rong-Xia ^{[1
]}

Tang Yu-Jun ^{[1
]}

Chen Wen-Jun ^{[1
]}

Lou Jian-Zhong ^{[1
]}

Ma Wen ^{[2
]}

机构：

[1] Hebei Univ, Coll Elect & Informat Engn, Baoding 071002, Peoples R China

[2] Chinese Peoples Armed Police Forces Acad, Lanfang 065000, Peoples R China

[3] Natl Testing Ctr Iron & Steel, Cent Iron & Steel Res Inst, Beijing 100081, Peoples R China

来源：

CHINESE PHYSICS LETTERS | 2008年 / 25卷 / 01期

关键词：

D O I：

暂无

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

A novel miniaturization of inductively coupled plasma (ICP) source based on printed circuit produced using micro-fabrication techniques is presented. The basic parameters of the novel ICP, including its radio frequency, power loss, size, and argon consumption are less than 1% of that for the case of atmospheric pressure ICP source. For example, at 100Pa of argon gas pressure, the present ICP source can be ignited by using the rf power less than 3.5 W. Potential applications of the ICP is discussed.

引用

页码：202 / 204

页数：3

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