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Total ionizing dose effects on Ag/ amorphous Bi3.15Nd0.85Ti3O12/Pt resistive switching memory
被引:1
|作者:
Song, H. J.
[1
,2
]
Yan, W. Z.
[1
,2
]
Zhong, X. L.
[1
,2
]
Zheng, S. Z.
[1
,2
]
Yang, Shengsheng
[3
]
Xue, Yuxiong
[3
]
Wang, Guangyi
[3
]
Guo, H. X.
[1
,2
]
Wang, J. B.
[1
,2
]
机构:
[1] Xiangtan Univ, Sch Mat Sci & Engn, Xiangtan 411105, Hunan, Peoples R China
[2] Xiangtan Univ, Natl Prov Lab Special Funct Thin Film Mat, Xiangtan 411105, Hunan, Peoples R China
[3] Lanzhou Inst Phys, Natl Key Lab Sci & Technol Vacuum Technol & Phys, Lanzhou 730000, Gansu, Peoples R China
基金:
中国国家自然科学基金;
关键词:
Total ionizing dose effects;
Resistive switching memory;
Ag electrode;
Amorphous Bi3.15Nd0.85Ti3O12 thin film;
RADIATION;
MECHANISMS;
FILAMENTS;
HARDNESS;
FILM;
D O I:
10.1016/j.matchemphys.2018.08.015
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
Here, the Ag/amorphous Bi3.15Nd0.85Ti3O12/Pt resistive switching memories were designed and prepared, and the total ionizing dose (TID) effects of Co-60 gamma-ray on the Ag/amorphous Bi3.15Nd0.85Ti3O12/Pt resistive switching memories were investigated. The results show that the resistance in low resistance state (LRS), resistance in high resistance state (HRS), and set voltage are almost immune to a TID up to 1 Mrad(Si), whereas the reset voltage and forming voltage are impacted slightly. The good radiation immunity is related to the metallic conductive filaments and the amorphous Bi3.15Nd0.85Ti3O12/Pt matrix. These results suggest that the Ag/amorphous Bi3.15Nd0.85Ti3O12/Pt devices show potential for radiation-hard electronics applications.
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页码:340 / 346
页数:7
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