High-performance beam stabilization for next-generation ArF beam delivery systems

被引：3
|
作者：
Lublin, L [1 ]
Warkentin, D [1 ]
Das, PP [1 ]
Ershov, AI [1 ]
Vipperman, J [1 ]
Spangler, RL [1 ]
Klene, B [1 ]
机构：
[1] Cymer Inc, Charlestown, MA 02129 USA
来源：
OPTICAL MICROLITHOGRAPHY XVI, PTS 1-3 | 2003年 / 5040卷
关键词：
beam stabilization; lithography; beam delivery;
D O I：
10.1117/12.485351
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
With the advent of 193 nm systems processing 300 mm wafers, the production lithography cell is about to undergo a technology shift. The mechanism for delivering the beam from the light source to the illumination system, here referred to as a Beam Delivery Unit (BDU), must change to meet the challenges imposed by this shift. To support these changes, Cymer is developing a BDU that will guarantee a stable beam at the scanner entrance during exposure. The beam stabilization control system has been implemented in a test BDU. We shall present results from experiments that demonstrate our ability to significantly improve short and long term "Beam Stability".
引用
收藏
页码：1682 / 1693
页数：12
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