High-performance beam stabilization for next-generation ArF beam delivery systems

被引：3

作者：

Lublin, L ^{[1
]}

Warkentin, D ^{[1
]}

Das, PP ^{[1
]}

Ershov, AI ^{[1
]}

Vipperman, J ^{[1
]}

Spangler, RL ^{[1
]}

Klene, B ^{[1
]}

机构：

[1] Cymer Inc, Charlestown, MA 02129 USA

来源：

OPTICAL MICROLITHOGRAPHY XVI, PTS 1-3 | 2003年 / 5040卷

关键词：

beam stabilization; lithography; beam delivery;

D O I：

10.1117/12.485351

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

With the advent of 193 nm systems processing 300 mm wafers, the production lithography cell is about to undergo a technology shift. The mechanism for delivering the beam from the light source to the illumination system, here referred to as a Beam Delivery Unit (BDU), must change to meet the challenges imposed by this shift. To support these changes, Cymer is developing a BDU that will guarantee a stable beam at the scanner entrance during exposure. The beam stabilization control system has been implemented in a test BDU. We shall present results from experiments that demonstrate our ability to significantly improve short and long term "Beam Stability".

引用

页码：1682 / 1693

页数：12

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