Change in surface morphology of polytetrafluoroethylene by reactive ion etching

被引:23
|
作者
Takahashi, Tomohiro [1 ]
Hirano, Yuki [1 ]
Takasawa, Yuya [1 ]
Gowa, Tomoko [1 ]
Fukutake, Naoyuki [1 ]
Oshima, Akihiro [2 ]
Tagawa, Seiichi [1 ,2 ]
Washio, Masakazu [1 ]
机构
[1] Waseda Univ, Res Inst Sci & Engn, Shinjuku Ku, Tokyo 1698555, Japan
[2] Osaka Univ, Inst Sci & Ind Res, Osaka 5670047, Japan
关键词
Plasma; PTFE; Reactive ion etching; Water repellency;
D O I
10.1016/j.radphyschem.2010.07.042
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Polytetrafluoroethylene (PTFE) was exposed to Ar, CF4, N-2 and O-2 plasmas using a reactive ion etching facility. After the exposure, the change in the surface morphology of PTFE was examined and characterization studies were performed for the etching rate, surface roughness, radical yields, chemical structures, water repellency and so on. The etching rates of Ar, CF4, N-2 and O-2 plasmas were 0.58, 7.2, 4.4 and 17 mu m/h, respectively. It was observed that needle-like nano-fiber structures on the surface were irregularly fabricated by the CF4 plasma. In addition, when the water repellency of exposed samples was evaluated by contact angle, they showed super-hydrophobic properties: contact angle over 150 degrees. Crown Copyright (C) 2010 Published by Elsevier Ltd. All rights reserved.
引用
收藏
页码:253 / 256
页数:4
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