Chemical vapor deposition (CVD) of parylene films using liquid source delivery

被引：0
|
作者：
Xu, CY [1 ]
Baum, TH [1 ]
机构：
[1] Adv Delivery & Chem Syst Ltd, Adv Technol Mat Inc, Danbury, CT 06810 USA
来源：
PROPERTIES AND PROCESSING OF VAPOR-DEPOSITED COATINGS | 1999年 / 555卷
关键词：
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Parylene-N films were formed on silicon substrates at a substrate temperature of -20 degrees C and pressures from 4 - 7 torr via liquid source precursor delivery. [2.2] Paracyclophane, the precursor of parylene-N, was dissolved in an organic solvent and delivered into a vaporizer / pyrolysis unit. The solution was vaporized at similar to 200 degrees C and its vapor was cracked at similar to 700 degrees C to generate the reactive monomeric species. Films were grown by condensation and polymerization, and analyzed by infrared (FTIR), thermogravimetric analysis (TGA) and X-ray diffraction (XRD) analysis. These analyses indicated the formation of parylene-N films without detectable solvent contamination or incorporation into the polymeric films.
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页码：155 / 160
页数：6
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