Early history of vacuum arc deposition

被引：19
|
作者：
Boxman, RL [1 ]
机构：
[1] Tel Aviv Univ, Fleischman Fac Engn, Elect Discharge & Plasma Lab, IL-69978 Tel Aviv, Israel
来源：
IEEE TRANSACTIONS ON PLASMA SCIENCE | 2001年 / 29卷 / 05期
关键词：
coatings; Thomas A. Edison; history; thin films; vacuum arc; Arthur W. Wright;
D O I：
10.1109/27.964470
中图分类号：
O35 [流体力学]; O53 [等离子体物理学];
学科分类号：
070204 ; 080103 ; 080704 ;
摘要：
Vacuu arc deposition (VAD) was first investigated at the end of the 19th century by A. W. Wright and T. A. Edison, as mirror coatings and seed layers for phonogram replication molds, respectively. The early research anticipated later developments, including cathode shielding, multi-lar coatings, substrate motion, and hybrid processing.
引用
收藏
页码：759 / 761
页数：3
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