Early history of vacuum arc deposition

被引：19
|
作者：
Boxman, RL [1 ]
机构：
[1] Tel Aviv Univ, Fleischman Fac Engn, Elect Discharge & Plasma Lab, IL-69978 Tel Aviv, Israel
来源：
IEEE TRANSACTIONS ON PLASMA SCIENCE | 2001年 / 29卷 / 05期
关键词：
coatings; Thomas A. Edison; history; thin films; vacuum arc; Arthur W. Wright;
D O I：
10.1109/27.964470
中图分类号：
O35 [流体力学]; O53 [等离子体物理学];
学科分类号：
070204 ; 080103 ; 080704 ;
摘要：
Vacuu arc deposition (VAD) was first investigated at the end of the 19th century by A. W. Wright and T. A. Edison, as mirror coatings and seed layers for phonogram replication molds, respectively. The early research anticipated later developments, including cathode shielding, multi-lar coatings, substrate motion, and hybrid processing.
引用
收藏
页码：759 / 761
页数：3
相关论文
共 50 条
  • [11] Recent progress in filtered vacuum arc deposition
    Boxman, R.L.
    Zhitomirsky, V.
    Alterkop, B.
    Gidalevich, E.
    Beilis, I.
    Keidar, M.
    Goldsmith, S.
    Surface and Coatings Technology, 1996, 86-87 (1 -3 pt 1): : 243 - 253
  • [12] High rate deposition by vacuum arc methods
    Schultrich, B
    Siemroth, P
    Scheibe, HJ
    SURFACE & COATINGS TECHNOLOGY, 1997, 93 (01): : 64 - 68
  • [13] VACUUM DEPOSITION OF FERRITE FILMS BY ARC DISCHARGE
    YAMANAKA, S
    NAOE, M
    ELECTRICAL ENGINEERING IN JAPAN, 1966, 86 (11) : 106 - +
  • [14] Vacuum Arc Deposition using Refractory Electrodes
    Beilis, I. I.
    Koulik, Y.
    Yankelevich, E.
    Arbilly, D.
    Boxman, R. L.
    PROCEEDINGS OF THE 2014 26TH INTERNATIONAL SYMPOSIUM ON DISCHARGES AND ELECTRICAL INSULATION IN VACUUM (ISDEIV-2014), 2014, : 513 - 516
  • [15] Magnetic control in vacuum arc deposition: A review
    Boxman, RL
    Beilis, II
    Gidalevich, E
    Zhitomirsky, VN
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 2005, 33 (05) : 1618 - 1625
  • [16] Recent progress in filtered vacuum arc deposition
    Boxman, RL
    Zhitomirsky, V
    Alterkop, B
    Gidalevich, E
    Beilis, I
    Keidar, M
    Goldsmith, S
    SURFACE & COATINGS TECHNOLOGY, 1996, 86 (1-3): : 243 - 253
  • [17] Magnetic control in vacuum arc deposition - a review
    Boxman, RL
    Beilis, II
    Gidalevich, E
    Zhitomirsky, VN
    ISDEIV: XXITH INTERNATIONAL SYMPOSIUM ON DISCHARGES AND ELECTRICAL INSULATION IN VACUUM, VOLS 1 AND 2, PROCEEDINGS, 2004, 21 : 473 - 479
  • [18] Process Intensification in Vacuum Arc Deposition Setups
    Baranov, Oleg
    Romanov, Maxim
    PLASMA PROCESSES AND POLYMERS, 2009, 6 (02) : 95 - 100
  • [19] VACUUM DEPOSITION OF FERRITE FILMS BY ARC DISCHARGE
    YAMANAKA, S
    NAOE, M
    JAPANESE JOURNAL OF APPLIED PHYSICS, 1966, 5 (06) : 558 - &
  • [20] High rate deposition by vacuum arc methods
    Fraunhofer-Inst fuer Werkstoff- und, Strahltechnik IWS, Dresden, Germany
    Surface and Coatings Technology, 1997, 93 (01): : 64 - 68
12345