Body PiN diode inactivation with low on-resistance achieved by a 1.2 kV-class 4H-SiC SWITCH-MOS

被引:0
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作者
Kobayashi, Yusuke [1 ,2 ]
Ohse, Naoyuki [1 ]
Morimoto, Tadao [2 ]
Kato, Makoto [2 ]
Kojima, Takahito [1 ]
Miyazato, Masaki [1 ,2 ]
Takei, Manabu [1 ,2 ]
Kimura, Hiroshi [1 ]
Harada, Shinsuke [2 ]
机构
[1] Fuji Elect Co Ltd, Matsumoto, Nagano, Japan
[2] Natl Inst Adv Ind Sci & Technol, Tsukuba, Ibaraki, Japan
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中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Integration of SBD into SiC-MOSFET is promising to solve body-PiN-diode related problems known such as forward degradation and reverse recovery loss. Particularly in lower breakdown-voltage-class SBD-integrated MOSFET, cell pitch reduction has a greater impact on inactivating the body-PiN-diode. Here, we developed a novel device called an SBD-wall-integrated trench MOSFET (SWITCH-MOS), in which small cell pitch of 5 mu m was realized by utilizing trench side walls both for SBD and MOS channel with buried p(+) layer. The fabricated 1.2 kV SWITCH-MOS successfully suppressed the forward degradation under extremely high current density condition with low switching loss, low specific on-resistance, and low leakage current.
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页数:4
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