Combinatorial chemical vapor deposition of metal dioxides using anhydrous metal nitrates

被引：27
|
作者：
Smith, RC
Hoilien, N
Roberts, J
Campbell, SA
Gladfelter, WL
机构：
[1] Univ Minnesota, Dept Chem, Minneapolis, MN 55455 USA
[2] Univ Minnesota, Dept Elect & Comp Engn, Minneapolis, MN 55455 USA
来源：
CHEMISTRY OF MATERIALS | 2002年 / 14卷 / 02期
关键词：
D O I：
10.1021/cm011538m
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Modification of a low-pressure CVD reactor and the similar deposition chemistries of Ti(NO3)4, Sn(NO3)4, and Hf(NO3)4 allowed the growth of films on silicon exhibiting a compositional spread of the respective metal dioxides. Electrical measurements of 100 x 100 μm capacitors (shown in the picture) suggest that the dielectric constant of the film can be estimated by a weighted average of the dielectric constants of the individual oxides.
引用
收藏
页码：474 / 476
页数：3
相关论文
共 50 条
  • [21] VIBRATIONAL-SPECTRA OF ANHYDROUS METAL PYRIDINE NITRATES
    CHOCA, M
    FERRARO, JR
    NAKAMOTO, K
    JOURNAL OF THE CHEMICAL SOCIETY-DALTON TRANSACTIONS, 1972, (20): : 2297 - &
  • [22] THE INFRARED SPECTRA OF ANHYDROUS TRANSITION-METAL NITRATES
    ADDISON, CC
    GATEHOUSE, BM
    JOURNAL OF THE CHEMICAL SOCIETY, 1960, (FEB): : 613 - 616
  • [23] Fluorapatite coatings by metal organic chemical vapor deposition
    Ciliberto, E
    Spoto, G
    CHEMICAL COMMUNICATIONS, 1997, (16) : 1483 - 1484
  • [24] Graphene Grown by Chemical Vapor Deposition on Metal Foams
    Banciu, C.
    Lungulescu, M.
    Bara, A.
    Sbarcea, G.
    Patroi, D.
    Marinescu, V
    12TH INTERNATIONAL CONFERENCE OF PROCESSES IN ISOTOPES AND MOLECULES (PIM 2019), 2020, 2206
  • [25] CHEMICAL VAPOR-DEPOSITION PRECURSORS FOR METAL SILICIDES
    MADAR, R
    THOMAS, N
    BERNARD, C
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1993, 17 (1-3): : 118 - 125
  • [26] Development of Chemical Vapor Deposition and Refractory Metal Materials
    Li Xiankuan
    Chen Li
    Cai Hongzhong
    Wei Qiaoling
    Hu Changyi
    RARE METAL MATERIALS AND ENGINEERING, 2010, 39 : 438 - 443
  • [27] Chemical vapor deposition of TiN on transition metal substrates
    von Fieandt, L.
    Larsson, T.
    Lindahl, E.
    Backe, O.
    Boman, M.
    SURFACE & COATINGS TECHNOLOGY, 2018, 334 : 373 - 383
  • [28] Chemical vapor deposition of graphene on liquid metal catalysts
    Ding, Guqiao
    Zhu, Yun
    Wang, Shumin
    Gong, Qian
    Sun, Lei
    Wu, Tianru
    Xie, Xiaoming
    Jiang, Mianheng
    CARBON, 2013, 53 : 321 - 326
  • [29] Metal-organic chemical vapor deposition of ZnO
    Pan, M
    Fenwick, WE
    Strassburg, M
    Li, N
    Kang, H
    Kane, MH
    Asghar, A
    Gupta, S
    Varatharajan, R
    Nause, J
    El-Zein, N
    Fabiano, P
    Steiner, T
    Ferguson, I
    JOURNAL OF CRYSTAL GROWTH, 2006, 287 (02) : 688 - 693
  • [30] CHEMICAL VAPOR DEPOSITION OF REFRACTORY METAL CLADDINGS ON MICROSPHERES
    SUMP, KR
    HOWARD, BD
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1970, 117 (03) : C106 - &
12345