Combinatorial chemical vapor deposition of metal dioxides using anhydrous metal nitrates

被引：27
|
作者：
Smith, RC
Hoilien, N
Roberts, J
Campbell, SA
Gladfelter, WL
机构：
[1] Univ Minnesota, Dept Chem, Minneapolis, MN 55455 USA
[2] Univ Minnesota, Dept Elect & Comp Engn, Minneapolis, MN 55455 USA
来源：
CHEMISTRY OF MATERIALS | 2002年 / 14卷 / 02期
关键词：
D O I：
10.1021/cm011538m
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Modification of a low-pressure CVD reactor and the similar deposition chemistries of Ti(NO3)4, Sn(NO3)4, and Hf(NO3)4 allowed the growth of films on silicon exhibiting a compositional spread of the respective metal dioxides. Electrical measurements of 100 x 100 μm capacitors (shown in the picture) suggest that the dielectric constant of the film can be estimated by a weighted average of the dielectric constants of the individual oxides.
引用
收藏
页码：474 / 476
页数：3
相关论文
共 50 条
  • [1] Combinatorial chemical vapor deposition of metal silicate films using tri(t-butoxy) silanol and anhydrous metal nitrates
    Zhong, LJ
    Chen, F
    Campbell, SA
    Gladfelter, WL
    COMBINATORIAL AND ARTIFICIAL INTELLIGENCE METHODS IN MATERIALS SCIENCE II, 2004, 804 : 15 - 19
  • [2] Chemical vapor deposition of ZrxHf1-xO2 thin films using anhydrous mixed-metal nitrates precursors
    Zhang, Wen-Qi
    Huang, Liu-Ying
    Li, Ai-Dong
    Shao, Qi-Yue
    Wu, Di
    INTEGRATED FERROELECTRICS, 2008, 97 (93-102) : 93 - 102
  • [3] ANHYDROUS METAL NITRATES
    ADDISON, CC
    LOGAN, N
    ADVANCES IN INORGANIC CHEMISTRY, 1964, 6 : 71 - 142
  • [4] Anhydrous Ethanol Dehydrogenation on Metal Organic Chemical Vapor Deposition Grown GaN(0001)
    Walenta, Constantin A.
    Kollmannsberger, Sebastian L.
    Pereira, Rui N.
    Tschurl, Martin
    Stutzmann, Martin
    Heiz, Ueli
    JOURNAL OF PHYSICAL CHEMISTRY C, 2017, 121 (30): : 16393 - 16398
  • [5] REACTION OF ANHYDROUS METAL NITRATES WITH GRAPHITE
    STUMPP, E
    NIETFELD, G
    STEINWEDE, K
    WAGERINGEL, KD
    SYNTHETIC METALS, 1983, 7 (1-2) : 143 - 151
  • [6] INTERCALATION OF GRAPHITE WITH ANHYDROUS METAL NITRATES
    STUMPP, E
    NIETFELD, G
    STEINWEDE, K
    WAGERINGEL, KD
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1982, 184 (SEP): : 143 - INOR
  • [7] ULTRAVIOLET SPECTRA OF ANHYDROUS METAL NITRATES
    ADDISON, CC
    SUTTON, D
    JOURNAL OF THE CHEMICAL SOCIETY A -INORGANIC PHYSICAL THEORETICAL, 1966, (11): : 1524 - &
  • [8] GeSn Film Deposition using Metal Organic Chemical Vapor Deposition
    Suda, K.
    Uno, T.
    Miyakawa, T.
    Machida, H.
    Ishikawa, M.
    Sudo, H.
    Ohshita, Y.
    Ogura, A.
    GRAPHENE, GE/III-V, AND EMERGING MATERIALS FOR POST CMOS APPLICATIONS 5, 2013, 53 (01): : 245 - 250
  • [9] Chemical vapor deposition of high-k oxide films using novel anhydrous mental nitrates as precursors
    School of Material Science and Engineering, Southeast University, Nanjing 211189, China
    不详
    不详
    Gongneng Cailiao/Journal of Functional Materials, 2008, 39 (04): : 574 - 577
  • [10] THE INFRARED SPECTRA OF ANHYDROUS TRANSITION METAL NITRATES
    ADDISON, CC
    GATEHOUSE, BM
    CHEMISTRY & INDUSTRY, 1958, (16) : 464 - 465
12345