Micromachined self-aligned microlens(SAM) for microcolumn electron beam

被引：1
|
作者：
Lee, YJ
Kang, SH
Chun, K
机构：
[1] School of Electrical Engineering, Seoul National University, Seoul
来源：
MICROELECTRONIC ENGINEERING | 1997年 / 35卷 / 1-4期
关键词：
D O I：
10.1016/S0167-9317(96)00144-X
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
This paper presents a technique for fabricating Self-Aligned Microlens(SAM) for microcolumn electron beam lithography system. By mixing surface- and bulk- micromachining technology, microbridges were formed at both sides of silicon wafer symmetrically. The alignment error could be controlled within a few micrometers and assembly processes were reduced.
引用
收藏
页码：413 / 416
页数：4
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