Micromachined self-aligned microlens(SAM) for microcolumn electron beam

被引：1

作者：

Lee, YJ

Kang, SH

Chun, K

机构：

[1] School of Electrical Engineering, Seoul National University, Seoul

来源：

MICROELECTRONIC ENGINEERING | 1997年 / 35卷 / 1-4期

关键词：

D O I：

10.1016/S0167-9317(96)00144-X

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

This paper presents a technique for fabricating Self-Aligned Microlens(SAM) for microcolumn electron beam lithography system. By mixing surface- and bulk- micromachining technology, microbridges were formed at both sides of silicon wafer symmetrically. The alignment error could be controlled within a few micrometers and assembly processes were reduced.

引用

页码：413 / 416

页数：4

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