CHIRPED PULSED BIAS POWER IN INDUCTIVELY COUPLED PLASMA REACTORS

被引：0
|
作者：
Lanham, Steven J. [1 ]
Kushner, Mark J. [1 ]
机构：
[1] Univ Michigan, Ann Arbor, MI 48109 USA
来源：
2016 43RD IEEE INTERNATIONAL CONFERENCE ON PLASMA SCIENCE (ICOPS) | 2016年
关键词：
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页数：1
相关论文
共 50 条
  • [21] Negative power absorption in inductively coupled plasma
    Godyak, VA
    Kolobov, VI
    PHYSICAL REVIEW LETTERS, 1997, 79 (23) : 4589 - 4592
  • [22] NOISE POWER SPECTRA OF THE INDUCTIVELY COUPLED PLASMA
    WALDEN, GL
    BOWER, JN
    NIKDEL, S
    BOLTON, DL
    WINEFORDNER, JD
    SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY, 1980, 35 (09) : 535 - 546
  • [23] Time-resolved ion energy distribution in pulsed inductively coupled argon plasma with/without DC bias
    Chen, Zhiying
    Blakeney, Joel
    Carruth, Megan
    Ventzek, Peter L. G.
    Ranjan, Alok
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2022, 40 (03):
  • [24] Capacitive Electron Cooling in an Inductively Coupled Plasma Source/Capacitively Coupled Plasma Bias Reactor
    Jun, Hyun-Su
    Lee, Dong-Seok
    Chang, Hong-Young
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2013, 52 (10)
  • [25] Optical emission spectroscopy of pulsed inductively coupled plasma in Ar
    Hioki, K
    Itazu, N
    Petrovic, ZL
    Makabe, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 2001, 40 (11A): : L1183 - L1186
  • [26] Pulsed low frequency inductively coupled plasma generator and applications
    Teske, Christian James
    Jacoby, Joachim
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 2008, 36 (04) : 1930 - 1936
  • [27] Time evolution of electronegativity in a pulsed inductively coupled oxygen plasma
    Lee, Jeong-Beom
    Seo, Sang-Hun
    Chang, Hong-Young
    THIN SOLID FILMS, 2010, 518 (22) : 6573 - 6577
  • [28] Viscous effects on motion and heating of electrons in inductively coupled plasma reactors
    Chang, CH
    Bose, D
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 1999, 27 (05) : 1310 - 1316
  • [29] Effect of bias application to plasma density in weakly magnetized inductively coupled plasma
    Kim, Hyuk
    Lee, Woohyun
    Park, Wanjae
    Whang, Ki-Woong
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2013, 31 (04):
  • [30] Fluid simulation of the plasma uniformity in pulsed dual frequency inductively coupled plasma
    Sun, Xiao-Yan
    Zhang, Yu-Ru
    Chai, Sen
    Wang, You-Nian
    He, Jian-Xin
    PHYSICS OF PLASMAS, 2019, 26 (04)
12345