Oxidition resistance of multi-arc ion plating TiN Films

被引：0
|
作者：
Wang, Jie [1 ]
Jiang, Shihang [1 ]
Wang, JuanJuan [1 ]
机构：
[1] Yangzhou Univ, Coll Mech Engn, Yangzhou 225127, Jiangsu, Peoples R China
来源：
MECHATRONICS AND INTELLIGENT MATERIALS III, PTS 1-3 | 2013年 / 706-708卷
关键词：
TiN film; Oxidation resistance; Adhesion strength;
D O I：
10.4028/www.scientific.net/AMR.706-708.180
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Depositing TiN Film on the surface of 4Cr5MoSiV1 with multi-arc ion plating technology method. And 350 degrees C, 450 degrees C, 550 degrees C and 650 degrees C short oxidation test and 550 degrees C cyclic oxidation test. By scanning electron microscopy (SEM) and electron spectrometry (EDS) to analysis micro-structure and phase structure of test samples, study TiN film on oxidation resistance, and utilize indentation method to measure mechanical properties. Results show: In a short time under oxidizing conditions, at 550 degrees C the TiN film still has a good oxidation resistance. The film still have a sufficient bonding strength below 600 degrees C.
引用
收藏
页码：180 / 183
页数：4
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