Facile approach to ZnO nanorods by directly etching zinc substrate

被引：4
|
作者：
Lei, Ying [1 ,2 ]
Wang, Jing [1 ,2 ]
Qu, Fengyu [1 ,2 ]
Li, Hui [3 ]
Wu, Xiang [1 ,2 ]
机构：
[1] Harbin Normal Univ, Key Lab Photon & Elect Bandgap Mat, Minist Educ, Harbin 150025, Peoples R China
[2] Harbin Normal Univ, Coll Chem & Chem Engn, Harbin 150025, Peoples R China
[3] Daqing Drilling Engn Co, Branch Drilling Prod Technol Serv 1, Daqing 163000, Peoples R China
来源：
MICRO & NANO LETTERS | 2012年 / 7卷 / 05期
关键词：
LOW-TEMPERATURE; NANOSTRUCTURES; NANOPARTICLES; NANOWIRES; EMISSION; GROWTH; ARRAYS;
D O I：
10.1049/mnl.2012.0067
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
The growth of ZnO nanorods by directly etching Zn foil through a low-temperature aqueous method has been demonstrated. The as-obtained ZnO nanorod possesses a single crystalline structure. The morphologies of ZnO nanostructures are sensitive to a series of growth parameters. Room-temperature photoluminescence property of the as-synthesised ZnO nanorods shows a strong ultraviolet emission peak at 379 nm. The present work demonstrates the feasibility of the growth of semiconductor nanorods by directly etching the substrate.
引用
收藏
页码：485 / 488
页数：4
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