Understanding the Selective Etching of Electrodeposited ZnO Nanorods

被引:17
|
作者
Illy, Benoit N. [1 ,2 ]
Ingham, Bridget [3 ,4 ]
Toney, Michael F. [5 ]
Nandhakumar, Irish [6 ]
Ryan, Mary P. [1 ,2 ]
机构
[1] Univ London Imperial Coll Sci Technol & Med, Dept Mat, London SW7 2AZ, England
[2] Univ London Imperial Coll Sci Technol & Med, London Ctr Nanotechnol, London SW7 2AZ, England
[3] Callaghan Innovat, Lower Hutt 5040, New Zealand
[4] Victoria Univ Wellington, MacDiarmid Inst Adv Mat & Nanotechnol, Wellington 6140, New Zealand
[5] SLAC Natl Accelerator Lab, Stanford Synchrotron Radiat Lightsource, Menlo Pk, CA 94025 USA
[6] Univ Southampton, Sch Chem, Southampton SO17 1BJ, Hants, England
基金
英国工程与自然科学研究理事会;
关键词
IN-SITU SYNCHROTRON; NANOTUBE ARRAYS; ZINC-OXIDE; ELECTROCHEMICAL GROWTH; AQUEOUS-SOLUTION; LOW-TEMPERATURE; FABRICATION; NANOWIRE; NANOSTRUCTURES; DEPOSITION;
D O I
10.1021/la503765a
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
ZnO nanotubes were prepared by selective dissolution of electrodeposited nanorods. The effect of solution pH, rod morphology, and chloride ion concentration on the dissolution mechanism was studied. The selective etching was rationalized in terms of the surface energy of the different ZnO crystal faces and reactant diffusion. The nanorod diameter and chloride concentration are the most influential parameters on the dissolution mechanism because they control homogeneous dissolution or selective etching of the (110) and (002) surfaces. Bulk solution pH only has an effect on the rate of dissolution. By accurate control of the dissolution process, the nanomorphology can be tailored, and the formation of rods with a thin diameter (10-20 nm), cavity, or ultra-thin-walled tubes (2-5 nm) can be achieved.
引用
收藏
页码:14079 / 14085
页数:7
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