Facile approach to ZnO nanorods by directly etching zinc substrate

被引：4

作者：

Lei, Ying ^{[1
,2
]}

Wang, Jing ^{[1
,2
]}

Qu, Fengyu ^{[1
,2
]}

Li, Hui ^{[3
]}

Wu, Xiang ^{[1
,2
]}

机构：

[1] Harbin Normal Univ, Key Lab Photon & Elect Bandgap Mat, Minist Educ, Harbin 150025, Peoples R China

[2] Harbin Normal Univ, Coll Chem & Chem Engn, Harbin 150025, Peoples R China

[3] Daqing Drilling Engn Co, Branch Drilling Prod Technol Serv 1, Daqing 163000, Peoples R China

来源：

MICRO & NANO LETTERS | 2012年 / 7卷 / 05期

关键词：

LOW-TEMPERATURE; NANOSTRUCTURES; NANOPARTICLES; NANOWIRES; EMISSION; GROWTH; ARRAYS;

D O I：

10.1049/mnl.2012.0067

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The growth of ZnO nanorods by directly etching Zn foil through a low-temperature aqueous method has been demonstrated. The as-obtained ZnO nanorod possesses a single crystalline structure. The morphologies of ZnO nanostructures are sensitive to a series of growth parameters. Room-temperature photoluminescence property of the as-synthesised ZnO nanorods shows a strong ultraviolet emission peak at 379 nm. The present work demonstrates the feasibility of the growth of semiconductor nanorods by directly etching the substrate.

引用

页码：485 / 488

页数：4

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