SIMULATION OF SURFACE CHEMISTRY IN CVD TECHNOLOGIES: A DETAILED DEPOSITION MODEL WITH SURFACE DIFFUSION

被引：0
|
作者：
Klimovich, Sergei [1 ]
Gorbachev, Yuriy [2 ]
Krzhizhanovskaya, Valeria [3 ]
机构：
[1] St Petersburg State Polytech Univ, St Petersburg, Russia
[2] Geolink Syst Ltd, St Petersburg, Russia
[3] Univ Amsterdam, Amsterdam, Netherlands
来源：
PROCEEDINGS OF THE ASME INTERNATIONAL DESIGN ENGINEERING TECHNICAL CONFERENCES AND COMPUTERS AND INFORMATION IN ENGINEERING CONFERENCE, DETC 2010, VOL 3, A AND B | 2010年
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中图分类号：
TP39 [计算机的应用];
学科分类号：
081203 ; 0835 ;
摘要：
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页码：211 / +
页数：2
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