Small-signal characterization and modelling of 55 nm SiGe BiCMOS HBT up to 325 GHz

被引:15
|
作者
Deng, Marina [1 ]
Quemerais, Thomas [2 ]
Bouvot, Simon [1 ,2 ]
Gloria, Daniel [2 ]
Chevalier, Pascal [2 ]
Lepilliet, Sylvie [1 ]
Danneville, Francois [1 ]
Dambrine, Gilles [1 ]
机构
[1] Univ Lille, IEMN UMR CNRS 8520, Ave Poincare,CS60069, F-59652 Villeneuve Dascq, France
[2] STMicroelectronics, 850 Rue Jean Monnet, F-38926 Crolles, France
关键词
Device characterization; G-band; H-band; Heterojunction bipolar transistors (HBTs); Silicon-Germanium (SiGe);
D O I
10.1016/j.sse.2016.11.012
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper presents a small-signal characterization work on a recently developed 55 nm SiGe BiCMOS technology from STMicroelectronics. The SiGe HBT from a prototype BiCMOS 55 nm process was investigated up to 325 GHz. The full S-parameters from DC to 325 GHz under multiple bias conditions are presented for the first time for a SiGe HBT. A usual and simple approach for the off-wafer calibration associated to an on-wafer de-embedding procedure was used and remained valid up to 325 GHz thanks to a size reduction of the test structures. The extracted 300/325 GHz f(T)f(MAX) couple, reached at 14 mA/mu m(2) collector density and 1.2 V collector-emitter voltage, was validated up to 325 GHz. (C) 2016 Elsevier Ltd. All rights reserved.
引用
收藏
页码:150 / 156
页数:7
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