Chromium plating pollution source reduction by plasma source ion implantation

被引:22
|
作者
Chen, A
Qiu, X
Sridharan, K
Horne, WG
Dodd, RA
Hamdi, AH
Elmoursi, AA
Malaczynski, GW
Conrad, JR
机构
[1] GM CORP,RES LABS,WARREN,MI 48090
[2] EMPIRE HARD CHROME,CHICAGO,IL
来源
SURFACE & COATINGS TECHNOLOGY | 1996年 / 82卷 / 03期
关键词
plasma source ion implantation; chromium; nitrogen; tribology; environment;
D O I
10.1016/0257-8972(95)02745-9
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
There is growing concern over the environmental and workers' health issues due to the chemical baths and rinse water used in the hard chromium plating process. In this regard the significant hardening response of chromium to nitrogen ion implantation can be environmentally beneficial from the standpoint of decreasing the thickness and the frequency of application of chromium plating. In this paper the results of a study of nitrogen ion implantation of chrome-plated test flats using the non-line-of-sight plasma source ion implantation (PSII) process are discussed. Auger electron spectroscopy (AES) showed the implanted layer thickness to be about 2000 Angstrom. Electron spectroscopy for chemical analysis (ESCA) indicated the formation of chromium nitride phase in the implanted layer. The wear resistance improves after implantation owing to both surface hardening and a decrease in coefficient of friction. Corrosion resistance in saline solution improved moderately after PSII treatment.
引用
收藏
页码:305 / 310
页数:6
相关论文
共 50 条
  • [31] Measurement of sheath expansion in plasma source ion implantation
    Kim, YW
    Kim, GH
    Han, S
    Lee, Y
    Cho, J
    Rhee, SY
    SURFACE & COATINGS TECHNOLOGY, 2001, 136 (1-3): : 97 - 101
  • [32] Boron doping of silicon by plasma source ion implantation
    Univ of Wisconsin, Madison, United States
    Surf Coat Technol, 2-3 (247-253):
  • [33] NITROGEN PLASMA SOURCE ION-IMPLANTATION OF ALUMINUM
    WALTER, KC
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (02): : 945 - 950
  • [34] DEVELOPMENT OF PLASMA SOURCE ION-IMPLANTATION IN CHINA
    TANG, BY
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (02): : 867 - 869
  • [35] Nitrogen ion implantation into three-dimensional substrates by plasma source ion implantation
    Baba, K
    Hatada, R
    MATERIALS CHEMISTRY AND PHYSICS, 1998, 54 (1-3) : 135 - 138
  • [36] Simulation methods of ion sheath dynamics in plasma source ion implantation
    WANG Jiuli1
    2. State Key Laboratory of Materials Modification by Laser
    Chinese Science Bulletin, 2004, (08) : 757 - 765
  • [37] Simulation methods of ion sheath dynamics in plasma source ion implantation
    Wang, JL
    Zhang, GL
    Wang, YN
    Liu, YF
    Liu, CZ
    Yang, S
    CHINESE SCIENCE BULLETIN, 2004, 49 (08): : 757 - 765
  • [38] Measurement of ion species ratio in the plasma source ion implantation process
    Tang, B.Y.
    Fetherston, R.P.
    Shamim, M.
    Breun, R.A.
    Chen, A.
    Conrad, J.R.
    1600, (73):
  • [39] 2 ION FLUID MODEL FOR PLASMA SOURCE ION-IMPLANTATION
    THOMAS, K
    ALPORT, MJ
    SHERIDAN, TE
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (02): : 901 - 904
  • [40] Ion implantation comes to the rescue of hard chromium plating
    Alexander, RB
    PLATING AND SURFACE FINISHING, 1996, 83 (07): : 9 - 11