Design and fabrication of polarizing beam-splitter gratings for 441.6 nm

In the current paper, optimized parameters for producing a polarizing beam-splitter grating (period, photoresist thickness, and duty cycle) at 441.6 nm were found by calculation using the Gsolver (grating solver) software. The polarizing effects were achieved because of the nonsinusoidal profile of the gratings. Theoretical and experimental results confirmed the fabrication feasibility of the element. In addition, an optimized procedure was achieved by controlling the photoresist thickness and exposure energy.