Design and fabrication of polarizing beam-splitter gratings for 441.6 nm

被引：0
|
作者：
Shabestari, N. Partovi [1 ]
Asgari, A. [2 ]
Alimoradian, N. [3 ]
Jaleh, B. [3 ]
Ahmadalidokht, E. [1 ]
Araghi, H. [2 ]
机构：
[1] Laser & Opt Res Sch, Tehran, Iran
[2] Amirkabir Univ Technol, Tehran, Iran
[3] Bu Ali Sina Univ, Hamadan, Iran
来源：
JOURNAL OF APPLIED SPECTROSCOPY | 2013年 / 80卷 / 04期
关键词：
polarizing beam-splitter; polarization grating; holographic diffraction grating; COUPLED-WAVE ANALYSIS;
D O I：
10.1007/s10812-013-9804-6
中图分类号：
O433 [光谱学];
学科分类号：
0703 ; 070302 ;
摘要：
In the current paper, optimized parameters for producing a polarizing beam-splitter grating (period, photoresist thickness, and duty cycle) at 441.6 nm were found by calculation using the Gsolver (grating solver) software. The polarizing effects were achieved because of the nonsinusoidal profile of the gratings. Theoretical and experimental results confirmed the fabrication feasibility of the element. In addition, an optimized procedure was achieved by controlling the photoresist thickness and exposure energy.
引用
收藏
页码：556 / 559
页数：4
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