A COMPARATIVE STUDY ON ANALOG/RF PERFORMANCE OF ULTRA-THIN BODY (UTB) SOI AND DOUBLE GATE MOSFETs

被引:2
|
作者
Soin, Norhayati [1 ]
Lun, Yan Ching [1 ]
机构
[1] Univ Malaya, Fac Engn, Kuala Lumpur 50603, Malaysia
关键词
D O I
10.1109/SMELEC.2008.4770280
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper, a comprehensive comparison of analog/RF performance of ultra-thin-body (UTB) SOI and double-gate (DG) devices was investigated through simulation. Analog/RF figures of merit, which was being estimated including intrinsic gain, g(m)/g(ds), g(m)/I-ds, values, transition/cut-off frequency,f(T), maximum oscillation frequency, f(MAX), and minimum noise figure, NFmin. Due to the unique structure of double-gate (DG) devices, it can exhibit excellent analog/RF behaviors. Higher g(m)/I-ds ratio and intrinsic gain, g(m)/g(ds) can be received by comparing with the ultra-thin-body (UTB) SOI. Superior fT and f(MAX), which are due to higher transconductance, g, and lower output conductance, g(m)/g(ds) can be observed in the double-gate devices. In addition, better noise and gains performance can be achieved resulting from improved g.. Thus, the double-gate devices can be considered as better candidates for analog/RF applications.
引用
收藏
页码:76 / 81
页数:6
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