Negative ion formation in dissociative electron attachment to selected halogen derivatives of propane

被引:4
|
作者
Barszczewska, W. [2 ]
Kocisek, J. [1 ]
Skalny, J. [1 ]
Matejcik, V. [3 ]
Matejcik, S. [1 ]
机构
[1] Comenius Univ, Dept Expt Phys, Bratislava 84248, Slovakia
[2] Univ Podlasie, Dept Chem, PL-08110 Siedlce, Poland
[3] Comenius Univ, Fac Med, Bratislava 81372, Slovakia
关键词
Electron; Attachment; Halogen; Propane;
D O I
10.1016/j.ijms.2008.06.009
中图分类号
O64 [物理化学(理论化学)、化学物理学]; O56 [分子物理学、原子物理学];
学科分类号
070203 ; 070304 ; 081704 ; 1406 ;
摘要
Dissociative electron attachment(DEA) to halogenated derivatives of propane: 1-bromo-3-chloropropane, 2-bromo-1-chloropropane, 3-bromo-1,1,1-trichloropropane and 1,3-dibromo-1,1-difluoropropane was studied in the gas phase at ambient temperature using a high resolution crossed electron/molecule beams technique. The negative ions formed via DEA reaction were identified using mass spectrometric technique and the anion yields were measured in the electron energy range from 0 to 10eV. The absolute partial cross sections for DEA to the molecules were estimated using the relative flow technique. (C) 2008 Elsevier B.V. All rights reserved.
引用
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页码:103 / 106
页数:4
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