Negative ion formation in dissociative electron attachment to selected halogen derivatives of propane

被引：4

作者：

Barszczewska, W. ^{[2
]}

Kocisek, J. ^{[1
]}

Skalny, J. ^{[1
]}

Matejcik, V. ^{[3
]}

Matejcik, S. ^{[1
]}

机构：

[1] Comenius Univ, Dept Expt Phys, Bratislava 84248, Slovakia

[2] Univ Podlasie, Dept Chem, PL-08110 Siedlce, Poland

[3] Comenius Univ, Fac Med, Bratislava 81372, Slovakia

来源：

INTERNATIONAL JOURNAL OF MASS SPECTROMETRY | 2008年 / 277卷 / 1-3期

关键词：

Electron; Attachment; Halogen; Propane;

D O I：

10.1016/j.ijms.2008.06.009

中图分类号：

O64 [物理化学（理论化学）、化学物理学]; O56 [分子物理学、原子物理学];

学科分类号：

070203 ; 070304 ; 081704 ; 1406 ;

摘要：

Dissociative electron attachment(DEA) to halogenated derivatives of propane: 1-bromo-3-chloropropane, 2-bromo-1-chloropropane, 3-bromo-1,1,1-trichloropropane and 1,3-dibromo-1,1-difluoropropane was studied in the gas phase at ambient temperature using a high resolution crossed electron/molecule beams technique. The negative ions formed via DEA reaction were identified using mass spectrometric technique and the anion yields were measured in the electron energy range from 0 to 10eV. The absolute partial cross sections for DEA to the molecules were estimated using the relative flow technique. (C) 2008 Elsevier B.V. All rights reserved.

引用

页码：103 / 106

页数：4

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