共 50 条
- [42] Effective Scaling of Blockchain Beyond Consensus Innovations and Moore's Law: Challenges and Opportunities IEEE SYSTEMS JOURNAL, 2022, 16 (01): : 1424 - 1435
- [48] DSA patterning options for FinFET formation at 7nm node ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES VIII, 2016, 9777
- [49] The Role of Polysilicon Slurry and its Application in 7nm CMP SILICON COMPATIBLE MATERIALS, PROCESSES, AND TECHNOLOGIES FOR ADVANCED INTEGRATED CIRCUITS AND EMERGING APPLICATIONS 7, 2017, 77 (05): : 227 - 233