Fabrication of ultralarge single order diffraction grating with high surface flatness

被引:0
|
作者
Hua, Yilei [1 ]
Xie, Changqing [1 ]
Gao, Nan [1 ]
Zhu, Xiaoli [1 ]
Li, Hailiang [1 ]
机构
[1] Chinese Acad Sci, Inst Microelect, Key Lab Microelect Devices & Integrated Technol, Beijing, Peoples R China
关键词
diffraction grating; nano-fabrication; SUPPRESSION;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this work, we present the fabrication process of a large (100mmx40mm) and thick (30mm) single order diffraction grating with a very flat reflecting surface. This grating is designed for a soft X-ray monochromator. Three single order diffraction gratings with different line densities were integrated on one silicon plate. The gratings are patterned on a 6.35mm thick substrate using direct e-beam writing and etched using high density plasma. Then the grating is glued on to a 23.7mm thick bulk silicon. The flatness of the surface of the gratings was well controlled and tested with an interferometer, the test results show that the peak-to-valley value of the surface is less than 60nm, which meet the requirement for a soft X-ray monochromator.
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页数:4
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