Fabrication of ultralarge single order diffraction grating with high surface flatness

被引：0

作者：

Hua, Yilei ^{[1
]}

Xie, Changqing ^{[1
]}

Gao, Nan ^{[1
]}

Zhu, Xiaoli ^{[1
]}

Li, Hailiang ^{[1
]}

机构：

[1] Chinese Acad Sci, Inst Microelect, Key Lab Microelect Devices & Integrated Technol, Beijing, Peoples R China

来源：

2017 SYMPOSIUM ON DESIGN, TEST, INTEGRATION AND PACKAGING OF MEMS/MOEMS (DTIP 2017) | 2017年

关键词：

diffraction grating; nano-fabrication; SUPPRESSION;

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

In this work, we present the fabrication process of a large (100mmx40mm) and thick (30mm) single order diffraction grating with a very flat reflecting surface. This grating is designed for a soft X-ray monochromator. Three single order diffraction gratings with different line densities were integrated on one silicon plate. The gratings are patterned on a 6.35mm thick substrate using direct e-beam writing and etched using high density plasma. Then the grating is glued on to a 23.7mm thick bulk silicon. The flatness of the surface of the gratings was well controlled and tested with an interferometer, the test results show that the peak-to-valley value of the surface is less than 60nm, which meet the requirement for a soft X-ray monochromator.

引用

页数：4

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