Generation of second harmonic radiation from sub-stoichiometric silicon nitride thin films

被引:21
|
作者
Pecora, Emanuele Francesco [1 ,2 ]
Capretti, Antonio [1 ,2 ,3 ]
Miano, Giovanni [3 ]
Dal Negro, Luca [1 ,2 ,4 ]
机构
[1] Boston Univ, Dept Elect & Comp Engn, Boston, MA 02215 USA
[2] Boston Univ, Photon Ctr, Boston, MA 02215 USA
[3] Univ Naples Federico II, Dept Elect Engn & Informat Technol, I-80125 Naples, Italy
[4] Boston Univ, Div Mat Sci & Engn, Brookline, MA 02446 USA
关键词
OPTICAL MICROCAVITIES; CHIP; SPECTROSCOPY; DEFORMATION; REFLECTION; STRAIN; LIGHT;
D O I
10.1063/1.4801873
中图分类号
O59 [应用物理学];
学科分类号
摘要
Enhancing second-order optical processes in Si-compatible materials is important for the demonstration of innovative functionalities and nonlinear optical devices integrated on a chip. Here, we demonstrate significantly enhanced Second-Harmonic Generation (SHG) by silicon-rich silicon nitride materials over a broad spectral range, and show a maximum conversion efficiency of 4.5 x 10(-6) for sub-stoichiometric samples with 46 at. % silicon. The SHG process in silicon nitride thin films is systematically investigated over a range of material stoichiometry and thermal annealing conditions. These findings can enable the engineering of innovative Si-based devices for nonlinear signal processing and sensing applications on a Si platform. (C) 2013 AIP Publishing LLC
引用
收藏
页数:5
相关论文
共 50 条
  • [41] Optically modified second harmonic generation in silicon oxynitride thin films via local layer heating
    Lukes, Jakub
    Kanclir, Vit
    Vaclavik, Jan
    Melich, Radek
    Fuchs, Ulrike
    Zidek, Karel
    SCIENTIFIC REPORTS, 2023, 13 (01)
  • [42] Pulsed laser deposition of non-stoichiometric silicon nitride (SiNx) thin films
    J.M. Lackner
    W. Waldhauser
    R. Ebner
    M. Beutl
    G. Jakopic
    G. Leising
    H. Hutter
    M. Rosner
    Applied Physics A, 2004, 79 : 1525 - 1527
  • [43] Optically modified second harmonic generation in silicon oxynitride thin films via local layer heating
    Jakub Lukeš
    Vít Kanclíř
    Jan Václavík
    Radek Melich
    Ulrike Fuchs
    Karel Žídek
    Scientific Reports, 13
  • [44] Spectroscopic second harmonic generation measured on plasma-deposited hydrogenated amorphous silicon thin films
    Kessels, WMM
    Gielis, JJH
    Aarts, IMP
    Leewis, CM
    van de Sanden, MCM
    APPLIED PHYSICS LETTERS, 2004, 85 (18) : 4049 - 4051
  • [45] Phase formation and stability in TiOx and ZrOx thin films: Extremely sub-stoichiometric functional oxides for electrical and TCO applications
    Henning, Ralph A.
    Leichtweiss, Thomas
    Dorow-Gerspach, Daniel
    Schmidt, Ruediger
    Wolff, Niklas
    Schuermann, Ulrich
    Decker, Yannic
    Kienle, Lorenz
    Wuttig, Matthias
    Janek, Juergen
    ZEITSCHRIFT FUR KRISTALLOGRAPHIE-CRYSTALLINE MATERIALS, 2017, 232 (1-3): : 161 - 183
  • [46] Efficient second-harmonic generation in silicon nitride resonant waveguide gratings
    Ning, Tingyin
    Pietarinen, Henna
    Hyvarinen, Outi
    Kumar, Ravi
    Kaplas, Tommi
    Kauranen, Martti
    Genty, Goery
    OPTICS LETTERS, 2012, 37 (20) : 4269 - 4271
  • [47] Circular-difference effects in second-harmonic generation from thin films
    Sioncke, S
    Van Elshocht, S
    Verbiest, T
    Kauranen, M
    Phillips, KES
    Katz, TJ
    Persoons, A
    SYNTHETIC METALS, 2001, 124 (01) : 191 - 193
  • [48] Optical activity effects in second harmonic generation from anisotropic chiral thin films
    Sioncke, S
    Van Elshocht, S
    Verbiest, T
    Persoons, A
    Kauranen, M
    Phillips, KES
    Katz, TJ
    JOURNAL OF CHEMICAL PHYSICS, 2000, 113 (17): : 7578 - 7581
  • [49] Effect of Li concentration on second harmonic generation from widegap ZnMgO thin films
    Meng, Lei
    Yuan, Xueyou
    Gao, Junjie
    Liu, Wenkai
    Yang, Xiaoguang
    Zhai, Tianrui
    Yamada, Tomoaki
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2024, 63 (08)
  • [50] Second-harmonic generation from chalcopyrite-structure semiconductor thin films
    Electrotechnical Laboratory, 1-1-4 Umezono, Tsukuba-shi, Ibaraki-ken 305, Japan
    不详
    Opt. Lett., 4 (254-256):