A Statistical Approach for Measuring Dislocations In 2D Photonic Crystals

被引：1

作者：

Malureanu, R. ^{[1
]}

Frandsen, L. H. ^{[1
]}

机构：

[1] Tech Univ Denmark, Dept Commun Opt & Mat, DK-2800 Lyngby, Denmark

来源：

2008 INTERNATIONAL CONFERENCE ON NANOSCIENCE AND NANOTECHNOLOGY | 2008年

关键词：

AFM measures; photonic crystals; placement accuracy;

D O I：

10.1109/ICONN.2008.4639281

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

In this paper, a comparison between the placement accuracy of lattice atoms in photonic crystal structures fabricated with different lithographic techniques is made. Using atomic force microscopy measurements and self-developed algorithms for calculating the holes position within less than 0.01nm error, we establish the statistical disorder within such devices.

引用

页码：200 / 202

页数：3

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