A Statistical Approach for Measuring Dislocations In 2D Photonic Crystals

被引：1
|
作者：
Malureanu, R. [1 ]
Frandsen, L. H. [1 ]
机构：
[1] Tech Univ Denmark, Dept Commun Opt & Mat, DK-2800 Lyngby, Denmark
来源：
2008 INTERNATIONAL CONFERENCE ON NANOSCIENCE AND NANOTECHNOLOGY | 2008年
关键词：
AFM measures; photonic crystals; placement accuracy;
D O I：
10.1109/ICONN.2008.4639281
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
In this paper, a comparison between the placement accuracy of lattice atoms in photonic crystal structures fabricated with different lithographic techniques is made. Using atomic force microscopy measurements and self-developed algorithms for calculating the holes position within less than 0.01nm error, we establish the statistical disorder within such devices.
引用
收藏
页码：200 / 202
页数：3
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