Degradation and Recovery Property of Schottky Barrier Height of AlGaN/GaN High Electron Mobility Transistors under Reverse AC Electrical Stress

被引:0
|
作者
Shi, Lei [1 ]
Feng, Shi-Wei [1 ]
Guo, Chun-Sheng [1 ]
Zhu, Hui [1 ]
机构
[1] Beijing Univ Technol, Coll Elect Informat & Control Engn, Beijing 100124, Peoples R China
关键词
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中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We apply a reverse AC electrical stress on the Gate of AlGaN/GaN high electron mobility transistors (HEMTs). The change of Schottky Barrier height (SBH) with respect to time is derived from the I-V and C-V characteristics, respectively. The SBHs calculated from the two methods show similar decreasing trend. However, the one from I-V method recovers partly after stress is removed. The behaviour is attributed to the traps in AlGaN barrier and surface state of the gate as a result of the electrical stress, and the recovery of surface state is the main factor for the recovery phenomena.
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页码:275 / 277
页数:3
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